Electrodeposition of Silicon from the Low-Melting LiCl-KCl-CsCl-K₂SiF₆ Electrolytes

The possibility of silicon electrodeposition from the low-melting LiCl-KCl-CsCl-K 2 SiF 6 electrolytes has been studied. stability a silicon-containing additive was studied by cyclic voltammetry, and rate constant chemical reaction 4 release at temperature 827 K calculated. It is determined that constants velocity values in melt based on eutectic composition are orders magnitude higher, which indicates higher formation volatile compounds. Cyclic voltammetry also used to study electrochemical behavior melts under study. found electroreduction cathode not reversible proceeds one 4-electron reaction. diffusion coefficient calculated Matsuda-Ayabe equation 0.72·10 ?5 cm ·s ?1 823 K. According obtained voltammograms, parameters for were selected. At potential ?0.4 V vs QRE, dendritic deposits obtained.